Chemical vapor deposition thermal and plasma deposition of electronics materials
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| Format: | Book |
| Published: |
New YorklbVan Nostrand Reinholdlc1994
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| 020 | 0 | 0 | |a 0442010796 |
| 035 | |a 0000018833 | ||
| 039 | 9 | |y 200910091014 |z VLOAD | |
| 090 | 0 | 0 | |a TK 7836. |b S54 1994 |
| 100 | 1 | 0 | |a SivaramlhS. |
| 245 | 1 | 0 | |a Chemical vapor deposition |b thermal and plasma deposition of electronics materials |c S. Sivaram |
| 260 | 0 | 0 | |a New YorklbVan Nostrand Reinholdlc1994 |
| 300 | |a xii, 292p. |b ill. |c 24cm | ||
| 500 | 0 | 0 | |a Includes bibliographical references and index |
| 650 | 0 | 0 | |a Microlectronics industry |
| 650 | 0 | 0 | |a Chemical vapor deposition |
| 650 | 0 | 0 | |a Microelectronics |x Materials |
| 999 | |a vtls000018828 |c 19132 |d 19132 | ||