X-ray metrology in semiconductor manufacturing
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| Format: | Book |
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London
Taylor & Francis
2006
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MARC
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| 039 | 9 | |y 200910091705 |z VLOAD | |
| 090 | 0 | 0 | |a TK 874.58 |b B69 2006 |
| 100 | 1 | 0 | |a Bowen |h D.Keith (David Keith) |
| 245 | 1 | 0 | |a X-ray metrology in semiconductor manufacturing |c David K.Bowen,Brian K.Tenner |
| 260 | 0 | 0 | |a London |b Taylor & Francis |c 2006 |
| 300 | |a 279p. |b ill. |c 23cm | ||
| 500 | 0 | 0 | |a Includes index |
| 650 | 0 | 0 | |a Semiconductors |x design and construction |x quality control |
| 650 | 0 | 0 | |a Integrated circuits |x measurement |
| 650 | 0 | 0 | |a Semiconductor wafers |x inspection |
| 650 | 0 | 0 | |a X-Rays |x diffraction |
| 650 | 0 | 0 | |a Fluoroscopy |
| 700 | 1 | 1 | |a Tanneer |h B.K.(brian Keith) |
| 999 | |a vtls000030882 |c 20814 |d 20814 | ||


