X-ray metrology in semiconductor manufacturing

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Bibliographic Details
Main Author: Bowen
Other Authors: Tanneer
Format: Book
Published: London Taylor & Francis 2006
Subjects:
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100 1 0 |a Bowen  |h D.Keith (David Keith) 
245 1 0 |a X-ray metrology in semiconductor manufacturing  |c David K.Bowen,Brian K.Tenner 
260 0 0 |a London  |b Taylor & Francis  |c 2006 
300 |a 279p.  |b ill.  |c 23cm 
500 0 0 |a Includes index 
650 0 0 |a Semiconductors  |x design and construction  |x quality control 
650 0 0 |a Integrated circuits  |x measurement 
650 0 0 |a Semiconductor wafers  |x inspection 
650 0 0 |a X-Rays  |x diffraction 
650 0 0 |a Fluoroscopy 
700 1 1 |a Tanneer  |h B.K.(brian Keith) 
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