SiGe and Si strained-layer epitaxy for silicon heterostructure devices

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Bibliographic Details
Other Authors: Cressler
Format: Book
Published: Boca Raton CRC Press/Taylor & Francis c2008
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Description
Item Description:"The materials was previously published in Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy, Taylor & Francis. 2005"--T.p. verso
Physical Description:1 v. (various pagings) ill. 26cm
Bibliography:Includes bibliographical references and index
ISBN:9781420066852 (alk. paper)
1420066854 (alk. paper)