Ultraclean technology handbook
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int...
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| Format: | Book |
| Language: | English |
| Published: |
New York
Marcel Dekker
1993
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| Call Number : | TS 183 .U46 1993 |
MARC
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| 001 | 5671 | ||
| 003 | MY-KLNDU | ||
| 005 | 20241218052005.0 | ||
| 008 | s1993 nyua bi 000 0 eng d | ||
| 020 | |a 0824787536 (v. 1 : acid-free paper) | ||
| 039 | 9 | |a 201411141711 |b zul |c 201406161214 |d shahrim |c 200910081420 |d VLOAD |y 200910081400 |z VLOAD | |
| 040 | |a UPNM | ||
| 090 | |a TS 183 |b .U46 1993 | ||
| 245 | 0 | 0 | |a Ultraclean technology handbook |c edited by Tadahiro Ohmi. |
| 260 | |a New York |b Marcel Dekker |c 1993 | ||
| 300 | |a v. <1 > |b ill. |c 26 cm. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 505 | 0 | |a v. 1. Ultrapure water. | |
| 520 | |a Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int. | ||
| 650 | 0 | |a Manufacturing processes |x Cleaning. | |
| 700 | 1 | |a Ohmi, Tadahiro | |
| 999 | |a vtls000005919 |c 5671 |d 5671 | ||