Nano-CMOS gate dielectric engineering

This book is a systematic review of high-K gate dielectric materials for CMOS chips (complementary metaloxide semiconductors), which are used in image sensors and data convertors (amplifiers, digital camera sensors, etc). Scaling CMOS devices down to the nanoscale creates new materials challenges, a...

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Bibliographic Details
Main Author: Wong, Hei (Author)
Format: Book
Language:English
Published: Boca Raton, FL CRC Press 2012
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Summary:This book is a systematic review of high-K gate dielectric materials for CMOS chips (complementary metaloxide semiconductors), which are used in image sensors and data convertors (amplifiers, digital camera sensors, etc). Scaling CMOS devices down to the nanoscale creates new materials challenges, and one effective response is to introduce novel materials such as High K dielectrics. The book presents the fundamental physics and properties of High-K materials and how they can be fabricated and used in Nano CMOS device - See more at: http://www.betterworldbooks.com/nano-cmos-gate-dielectric-engineering-id-1439849595.aspx&utm_source=Affiliate&utm_campaign=Text&utm_medium=booklink&utm_term=3630151&utm_content=Homepage#sthash.mhf9DArw.dpuf
Physical Description:xiv, 234 pages illustrations 24 cm
Bibliography:Includes bibliographical references and index
ISBN:9781439849590