Nano-CMOS gate dielectric engineering

This book is a systematic review of high-K gate dielectric materials for CMOS chips (complementary metaloxide semiconductors), which are used in image sensors and data convertors (amplifiers, digital camera sensors, etc). Scaling CMOS devices down to the nanoscale creates new materials challenges, a...

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Bibliographic Details
Main Author: Wong, Hei (Author)
Format: Book
Language:English
Published: Boca Raton, FL CRC Press 2012
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100 1 |a Wong, Hei  |e author 
245 1 0 |a Nano-CMOS gate dielectric engineering  |c Hei Wong 
264 1 |a Boca Raton, FL  |b CRC Press  |c 2012 
300 |a xiv, 234 pages  |b illustrations  |c 24 cm 
336 |a text  |2 rdacontent 
337 |a unmediated  |2 rdamedia 
338 |a volume  |2 rdacarrier 
504 |a Includes bibliographical references and index 
505 0 |a 1. Overview of CMOS technology -- 2. High-k dielectrics -- 3. Complex forms of high-k oxides -- 4. Dielectric interfaces -- 5. Impacts on device operation -- 6. Fabrication issues -- 7. Conclusions 
520 |a This book is a systematic review of high-K gate dielectric materials for CMOS chips (complementary metaloxide semiconductors), which are used in image sensors and data convertors (amplifiers, digital camera sensors, etc). Scaling CMOS devices down to the nanoscale creates new materials challenges, and one effective response is to introduce novel materials such as High K dielectrics. The book presents the fundamental physics and properties of High-K materials and how they can be fabricated and used in Nano CMOS device - See more at: http://www.betterworldbooks.com/nano-cmos-gate-dielectric-engineering-id-1439849595.aspx&utm_source=Affiliate&utm_campaign=Text&utm_medium=booklink&utm_term=3630151&utm_content=Homepage#sthash.mhf9DArw.dpuf 
592 |a IN/30916  |b 16/03/2016  |c RM 460.42  |h Bookline Services 
650 0 |a Metal oxide semiconductors, Complementary  |x Design and construction 
650 0 |a Dielectrics 
650 0 |a Gate array circuits 
650 0 |a Nanoelectronics  |x Materials 
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