Particle control for semiconductor manufacturing
The trend toward chip designs of ever-decreasing dimensions promises increased importance for particle control partices. "Particle control for semiconductor manufacturing" focuses on submicrometer contaminants that introduce unwanted, unmodeled effected in device performance.
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| Format: | Book |
| Language: | English |
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New York, NY
Marcel Dekker
1990
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| 090 | |a TK 7871.85 |b .P358 1990 | ||
| 245 | 0 | 0 | |a Particle control for semiconductor manufacturing |c [edited by] R.P. Donovan |
| 260 | |a New York, NY |b Marcel Dekker |c 1990 | ||
| 300 | |a xii, 464 p. |b ill. |c 25 cm. | ||
| 504 | |a Includes bibliographical references and index | ||
| 520 | |a The trend toward chip designs of ever-decreasing dimensions promises increased importance for particle control partices. "Particle control for semiconductor manufacturing" focuses on submicrometer contaminants that introduce unwanted, unmodeled effected in device performance. | ||
| 650 | 0 | |a Semiconductors |x design and construction | |
| 650 | 0 | |a Semiconductors |x Defects | |
| 650 | 0 | |a Particles | |
| 700 | 1 | |a Donovan, R.P. | |
| 999 | |a vtls000004267 |c 4336 |d 4336 | ||